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Contactless monitoring of Si substrate permittivity and resistivity from microwave to millimeter wave frequencies This publication appears in: Microwave and Optical Technology Letters Authors: A. Elhawil, C. Neve, B. Olbrechts, I. Huynen, J. Raskin, G. Poesen, J. Stiens and R. Vounckx Volume: 52 Issue: 11 Pages: 2500-2505 Publication Date: Nov. 2010
Abstract: A contactless and nondestructive technique is employed for characterizing single-sided metallised silicon wafers. The reflection spectra are measured using a quasi-optical millmeter-wave setup in the frequency range 40너 GHz. The results are compared with those provided by the coplanar waveguide method, in terms of accuracy and range of applicability.
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